Anisotropic silicon nanowire arrays fabricated by colloidal lithography

The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays are coupled and cannot be addressed individually using colloi...

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Detalles Bibliográficos
Publicado en:Nanoscale Adv
Autores principales: Rey, Marcel, Wendisch, Fedja Jan, Aaron Goerlitzer, Eric Sidney, Julia Tang, Jo Sing, Bader, Romina Sigrid, Bourret, Gilles Remi, Vogel, Nicolas
Formato: Artigo
Lenguaje:Inglês
Publicado: RSC 2021
Materias:
Chemistry
Acceso en línea:https://ncbi.nlm.nih.gov/pmc/articles/PMC8204746/
https://ncbi.nlm.nih.gov/pubmed/34212129
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1039/d1na00259g
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