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Anisotropic silicon nanowire arrays fabricated by colloidal lithography
The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays are coupled and cannot be addressed individually using colloi...
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| Vydáno v: | Nanoscale Adv |
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| Hlavní autoři: | , , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
RSC
2021
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8204746/ https://ncbi.nlm.nih.gov/pubmed/34212129 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1039/d1na00259g |
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