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Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale
[Image: see text] We report on a quick, simple, and cost-effective solution-phase approach to prepare centimeter-sized morphology-graded vertically aligned Si nanowire arrays. Gradients in the nanowire diameter and shape are encoded through the macroscale substrate via a “dip-etching” approach, wher...
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| Publicado no: | ACS Appl Mater Interfaces |
|---|---|
| Main Authors: | , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American
Chemical Society
2020
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| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7082793/ https://ncbi.nlm.nih.gov/pubmed/32129591 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.9b21466 |
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