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Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy
This paper reports high-throughput, light-based, through-focus scanning optical microscopy (TSOM) for detecting industrially relevant sub-50 nm tall nanoscale contaminants. Measurement parameter optimization to maximize the TSOM signal using optical simulations made it possible to detect the nanosca...
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| Publicado no: | J Vac Sci Technol B Nanotechnol Microelectron |
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| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8201524/ https://ncbi.nlm.nih.gov/pubmed/34131513 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1116/6.0000352 |
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