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Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy
This paper reports high-throughput, light-based, through-focus scanning optical microscopy (TSOM) for detecting industrially relevant sub-50 nm tall nanoscale contaminants. Measurement parameter optimization to maximize the TSOM signal using optical simulations made it possible to detect the nanosca...
Gorde:
| Argitaratua izan da: | J Vac Sci Technol B Nanotechnol Microelectron |
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| Egile Nagusiak: | , , , , , |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
2020
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| Gaiak: | |
| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8201524/ https://ncbi.nlm.nih.gov/pubmed/34131513 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1116/6.0000352 |
| Etiketak: |
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