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UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and d...
Wedi'i Gadw mewn:
| Cyhoeddwyd yn: | Nanomaterials (Basel) |
|---|---|
| Prif Awduron: | , |
| Fformat: | Artigo |
| Iaith: | Inglês |
| Cyhoeddwyd: |
MDPI
2021
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| Pynciau: | |
| Mynediad Ar-lein: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8004728/ https://ncbi.nlm.nih.gov/pubmed/33806976 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11030822 |
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