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Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios
Mixed micro- and nanoscale structures are gaining popularity in various fields due to their rapid advances in patterning. An investigation in stamp resist filling with multiscale cavities via ultraviolet (UV) nanoimprint lithography (UV-NIL) is necessary to improve stamp design. Here, simulations at...
שמור ב:
| הוצא לאור ב: | Micromachines (Basel) |
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| Main Authors: | , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
MDPI
2018
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| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6082289/ https://ncbi.nlm.nih.gov/pubmed/30424268 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi9070335 |
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