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UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns
Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and d...
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| Publicat a: | Nanomaterials (Basel) |
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| Autors principals: | , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2021
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8004728/ https://ncbi.nlm.nih.gov/pubmed/33806976 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11030822 |
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