Thermophysical characterisation of VO(2) thin films hysteresis and its application in thermal rectification

Hysteresis loops exhibited by the thermophysical properties of VO(2) thin films deposited on either a sapphire or silicon substrate have been experimentally measured using a high frequency photothermal radiometry technique. This is achieved by directly measuring the thermal diffusivity and thermal e...

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Publicado en:Sci Rep
Autores principales: Hamaoui, Georges, Horny, Nicolas, Gomez-Heredia, Cindy Lorena, Ramirez-Rincon, Jorge Andres, Ordonez-Miranda, Jose, Champeaux, Corinne, Dumas-Bouchiat, Frederic, Alvarado-Gil, Juan Jose, Ezzahri, Younes, Joulain, Karl, Chirtoc, Mihai
Formato: Artigo
Lenguaje:Inglês
Publicado: Nature Publishing Group UK 2019
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Article
Acceso en línea:https://ncbi.nlm.nih.gov/pmc/articles/PMC6584564/
https://ncbi.nlm.nih.gov/pubmed/31217509
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-45436-0
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