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Thermal hysteresis measurement of the VO(2) emissivity and its application in thermal rectification
Hysteresis loops in the emissivity of VO(2) thin films grown on sapphire and silicon substrates by a pulsed laser deposition process are experimentally measured through the thermal-wave resonant cavity technique. Remarkable variations of about 43% are observed in the emissivity of both VO(2) films,...
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| Publicado no: | Sci Rep |
|---|---|
| Main Authors: | , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group UK
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5981426/ https://ncbi.nlm.nih.gov/pubmed/29855507 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-26687-9 |
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