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Thermophysical characterisation of VO(2) thin films hysteresis and its application in thermal rectification
Hysteresis loops exhibited by the thermophysical properties of VO(2) thin films deposited on either a sapphire or silicon substrate have been experimentally measured using a high frequency photothermal radiometry technique. This is achieved by directly measuring the thermal diffusivity and thermal e...
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| 出版年: | Sci Rep |
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| 主要な著者: | , , , , , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Nature Publishing Group UK
2019
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6584564/ https://ncbi.nlm.nih.gov/pubmed/31217509 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-45436-0 |
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