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Thermophysical characterisation of VO(2) thin films hysteresis and its application in thermal rectification
Hysteresis loops exhibited by the thermophysical properties of VO(2) thin films deposited on either a sapphire or silicon substrate have been experimentally measured using a high frequency photothermal radiometry technique. This is achieved by directly measuring the thermal diffusivity and thermal e...
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| Vydáno v: | Sci Rep |
|---|---|
| Hlavní autoři: | , , , , , , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Nature Publishing Group UK
2019
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6584564/ https://ncbi.nlm.nih.gov/pubmed/31217509 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-45436-0 |
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