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Miniaturization of CMOS
When the international technology roadmap of semiconductors (ITRS) started almost five decades ago, the metal oxide effect transistor (MOSFET) as units in integrated circuits (IC) continuously miniaturized. The transistor structure has radically changed from its original planar 2D architecture to to...
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| Veröffentlicht in: | Micromachines (Basel) |
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| Hauptverfasser: | , , , , , , , , , , , , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
MDPI
2019
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6563067/ https://ncbi.nlm.nih.gov/pubmed/31052223 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi10050293 |
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