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Particle atomic layer deposition
The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstro...
保存先:
| 出版年: | J Nanopart Res |
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| 第一著者: | |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer Netherlands
2019
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6320374/ https://ncbi.nlm.nih.gov/pubmed/30662321 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s11051-018-4442-9 |
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