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Particle atomic layer deposition
The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstro...
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| Publicado no: | J Nanopart Res |
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| Autor principal: | |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer Netherlands
2019
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6320374/ https://ncbi.nlm.nih.gov/pubmed/30662321 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s11051-018-4442-9 |
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