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Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition
Plasma-enhanced atomic layer deposition (PEALD) is a widely used, powerful layer-by-layer coating technology. Here, we present an atomistic simulation scheme for PEALD processes, combining the Monte Carlo deposition algorithm and structure relaxation using molecular dynamics. In contrast to previous...
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| Udgivet i: | Materials (Basel) |
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| Main Authors: | , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
MDPI
2019
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6719897/ https://ncbi.nlm.nih.gov/pubmed/31443331 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12162605 |
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