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Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
This paper describes the atomic layer deposition of In(2)(S,O)(3) films by using In(acac)(3) (acac = acetylacetonate), H(2)S and either H(2)O or O(2) plasma as oxygen sources. First, the growth of pure In(2)S(3) films was studied in order to better understand the influence of the oxygen pulses. X-Ra...
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| Autores principales: | , , , |
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| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Beilstein-Institut
2013
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| Materias: | |
| Acceso en línea: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3869344/ https://ncbi.nlm.nih.gov/pubmed/24367743 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.4.85 |
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