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Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition

[Image: see text] The ability to deposit thin and conformal films has become of great importance because of downscaling of devices. However, because of nucleation difficulty, depositing an electrically stable and thin conformal platinum film on an oxide nucleation layer has proven challenging. By us...

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Bibliografiske detaljer
Udgivet i:ACS Appl Mater Interfaces
Main Authors: Kim, Hyo Jin K., Kaplan, Kirsten E., Schindler, Peter, Xu, Shicheng, Winterkorn, Martin M., Heinz, David B., English, Timothy S., Provine, J., Prinz, Fritz B., Kenny, Thomas W.
Format: Artigo
Sprog:Inglês
Udgivet: American Chemical Society 2019
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC6407042/
https://ncbi.nlm.nih.gov/pubmed/30707831
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.8b21054
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