ロード中...
Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene
[Image: see text] Atomic layer deposition (ALD) of ultrathin aluminum oxide (AlO(x)) films was systematically studied on supported chemical vapor deposition (CVD) graphene. We show that by extending the precursor residence time, using either a multiple-pulse sequence or a soaking period, ultrathin c...
保存先:
| 出版年: | ACS Appl Mater Interfaces |
|---|---|
| 主要な著者: | , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
American
Chemical Society
2016
|
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5257172/ https://ncbi.nlm.nih.gov/pubmed/27723305 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.6b09596 |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|