Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene

[Image: see text] Atomic layer deposition (ALD) of ultrathin aluminum oxide (AlO(x)) films was systematically studied on supported chemical vapor deposition (CVD) graphene. We show that by extending the precursor residence time, using either a multiple-pulse sequence or a soaking period, ultrathin c...

Descrizione completa

Salvato in:
Dettagli Bibliografici
Pubblicato in:ACS Appl Mater Interfaces
Autori principali: Aria, Adrianus I., Nakanishi, Kenichi, Xiao, Long, Braeuninger-Weimer, Philipp, Sagade, Abhay A., Alexander-Webber, Jack A., Hofmann, Stephan
Natura: Artigo
Lingua:Inglês
Pubblicazione: American Chemical Society 2016
Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC5257172/
https://ncbi.nlm.nih.gov/pubmed/27723305
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.6b09596
Tags: Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne! !

Documenti analoghi