Damage evaluation in graphene underlying atomic layer deposition dielectrics

Based on micro-Raman spectroscopy (μRS) and X-ray photoelectron spectroscopy (XPS), we study the structural damage incurred in monolayer (1L) and few-layer (FL) graphene subjected to atomic-layer deposition of HfO(2) and Al(2)O(3) upon different oxygen plasma power levels. We evaluate the damage lev...

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Bibliografiska uppgifter
I publikationen:Sci Rep
Huvudupphovsmän: Tang, Xiaohui, Reckinger, Nicolas, Poncelet, Olivier, Louette, Pierre, Ureña, Ferran, Idrissi, Hosni, Turner, Stuart, Cabosart, Damien, Colomer, Jean-François, Raskin, Jean-Pierre, Hackens, Benoit, Francis, Laurent A.
Materialtyp: Artigo
Språk:Inglês
Publicerad: Nature Publishing Group 2015
Ämnen:
Article
Länkar:https://ncbi.nlm.nih.gov/pmc/articles/PMC4550929/
https://ncbi.nlm.nih.gov/pubmed/26311131
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep13523
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