טוען...
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by employing an aberration-corrected scanning transmission electron microscope as the exposure tool. Here, we present results of single-digit nanometer...
שמור ב:
| הוצא לאור ב: | J Vis Exp |
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| Main Authors: | , , , , , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
MyJove Corporation
2018
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| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6235187/ https://ncbi.nlm.nih.gov/pubmed/30272655 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3791/58272 |
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