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Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
[Image: see text] Area-selective atomic layer deposition (ALD) is envisioned to play a key role in next-generation semiconductor processing and can also provide new opportunities in the field of catalysis. In this work, we developed an approach for the area-selective deposition of metal oxides on no...
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| Udgivet i: | Chem Mater |
|---|---|
| Main Authors: | , , , , , , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
American Chemical
Society
2017
|
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5828705/ https://ncbi.nlm.nih.gov/pubmed/29503508 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.chemmater.7b03818 |
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