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Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Background: Focused electron beam induced deposition (FEBID) allows for the deposition of free standing material within nanometre sizes. The improvement of the technique needs a combination of new precursors and optimized irradiation strategies to achieve a controlled fragmentation of the precursor...

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Bibliografski detalji
Izdano u:Beilstein J Nanotechnol
Glavni autori: Sala, Leo, Szymańska, Iwona B, Dablemont, Céline, Lafosse, Anne, Amiaud, Lionel
Format: Artigo
Jezik:Inglês
Izdano: Beilstein-Institut 2018
Teme:
Online pristup:https://ncbi.nlm.nih.gov/pmc/articles/PMC5769079/
https://ncbi.nlm.nih.gov/pubmed/29379701
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.8
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