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Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Background: Focused electron beam induced deposition (FEBID) allows for the deposition of free standing material within nanometre sizes. The improvement of the technique needs a combination of new precursors and optimized irradiation strategies to achieve a controlled fragmentation of the precursor...

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Detalhes bibliográficos
Publicado no:Beilstein J Nanotechnol
Main Authors: Sala, Leo, Szymańska, Iwona B, Dablemont, Céline, Lafosse, Anne, Amiaud, Lionel
Formato: Artigo
Idioma:Inglês
Publicado em: Beilstein-Institut 2018
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5769079/
https://ncbi.nlm.nih.gov/pubmed/29379701
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.8
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