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A novel copper precursor for electron beam induced deposition
A fluorine free copper precursor, Cu(tbaoac)(2) with the chemical sum formula CuC(16)O(6)H(26) is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microsc...
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| Publicat a: | Beilstein J Nanotechnol |
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| Autors principals: | , , , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Beilstein-Institut
2018
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5942376/ https://ncbi.nlm.nih.gov/pubmed/29765799 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.113 |
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