Sala, L., Szymańska, I. B., Dablemont, C., Lafosse, A., & Amiaud, L. (2018). Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID). Beilstein J Nanotechnol.
Styl ChicagoSala, Leo, Iwona B. Szymańska, Céline Dablemont, Anne Lafosse, a Lionel Amiaud. "Response Under Low-energy Electron Irradiation of a Thin Film of a Potential Copper Precursor for Focused Electron Beam Induced Deposition (FEBID)." Beilstein J Nanotechnol 2018.
Citace podle MLASala, Leo, et al. "Response Under Low-energy Electron Irradiation of a Thin Film of a Potential Copper Precursor for Focused Electron Beam Induced Deposition (FEBID)." Beilstein J Nanotechnol 2018.
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