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Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
A novel supercycled atomic layer deposition (ALD) process which combines thermal ALD process with in situ O(2) plasma treatment is presented in this work to deposit ZnO thin films with highly tunable electrical properties. Both O(2) plasma time and the number of thermal ALD cycles in a supercycle ca...
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| Pubblicato in: | Nanoscale Res Lett |
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| Autori principali: | , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Springer US
2017
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5605484/ https://ncbi.nlm.nih.gov/pubmed/28929410 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2308-1 |
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