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Investigation of AlGaN/GaN high electron mobility transistor structures on 200-mm silicon (111) substrates employing different buffer layer configurations

AlGaN/GaN high electron mobility transistor (HEMT) structures are grown on 200-mm diameter Si(111) substrates by using three different buffer layer configurations: (a) Thick-GaN/3 × {Al(x)Ga(1−x)N}/AlN, (b) Thin-GaN/3 × {Al(x)Ga(1−x)N}/AlN, and (c) Thin-GaN/AlN, so as to have crack-free and low-bow...

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Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Lee, H.-P., Perozek, J., Rosario, L. D., Bayram, C.
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2016
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5116587/
https://ncbi.nlm.nih.gov/pubmed/27869222
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep37588
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