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X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement
X-ray masks present a measurement object that is different from most other objects used in semiconductor processing because the support membrane is, by design, x-ray transparent. This characteristic can be used as an advantage in electron beam-based x-ray mask metrology since, depending upon the inc...
Tallennettuna:
| Julkaisussa: | J Res Natl Inst Stand Technol |
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| Päätekijät: | , , , , , |
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1993
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| Aiheet: | |
| Linkit: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4907699/ https://ncbi.nlm.nih.gov/pubmed/28053482 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.098.032 |
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