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Submicrometer Linewidth Metrology In the Optical Microscope
The recent impetus of the semiconductor industry toward submicrometer feature sizes on integrated circuits has generated an immediate need for measurement tools and standards suitable for these features. Optical techniques have the advantages of being nondestructive and of having high throughput, bu...
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| Publicado no: | J Res Natl Bur Stand (1977) |
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| Main Authors: | , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1987
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5286966/ https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.092.017 |
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