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An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell
In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed...
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| Publicado no: | J Res Natl Inst Stand Technol |
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| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1995
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4887237/ https://ncbi.nlm.nih.gov/pubmed/29151752 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.100.032 |
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