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An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell
In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed...
Wedi'i Gadw mewn:
| Cyhoeddwyd yn: | J Res Natl Inst Stand Technol |
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| Prif Awduron: | , , , , |
| Fformat: | Artigo |
| Iaith: | Inglês |
| Cyhoeddwyd: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1995
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| Pynciau: | |
| Mynediad Ar-lein: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4887237/ https://ncbi.nlm.nih.gov/pubmed/29151752 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.100.032 |
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