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Monitoring the thin film formation during sputter deposition of vanadium carbide
The thin film formation of magnetron sputtered polycrystalline coatings was monitored by in situ X-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed...
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| 出版年: | J Synchrotron Radiat |
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| 主要な著者: | , , , , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
International Union of Crystallography
2015
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4294025/ https://ncbi.nlm.nih.gov/pubmed/25537591 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S1600577514024412 |
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