Monitoring the thin film formation during sputter deposition of vanadium carbide

The thin film formation of magnetron sputtered polycrystalline coatings was monitored by in situ X-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed...

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Udgivet i:J Synchrotron Radiat
Main Authors: Kaufholz, Marthe, Krause, Bärbel, Kotapati, Sunil, Köhl, Martin, Mantilla, Miguel F., Stüber, Michael, Ulrich, Sven, Schneider, Reinhard, Gerthsen, Dagmar, Baumbach, Tilo
Format: Artigo
Sprog:Inglês
Udgivet: International Union of Crystallography 2015
Fag:
Research Papers
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC4294025/
https://ncbi.nlm.nih.gov/pubmed/25537591
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S1600577514024412
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