Monitoring the thin film formation during sputter deposition of vanadium carbide

The thin film formation of magnetron sputtered polycrystalline coatings was monitored by in situ X-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Cyhoeddwyd yn:J Synchrotron Radiat
Prif Awduron: Kaufholz, Marthe, Krause, Bärbel, Kotapati, Sunil, Köhl, Martin, Mantilla, Miguel F., Stüber, Michael, Ulrich, Sven, Schneider, Reinhard, Gerthsen, Dagmar, Baumbach, Tilo
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: International Union of Crystallography 2015
Pynciau:
Research Papers
Mynediad Ar-lein:https://ncbi.nlm.nih.gov/pmc/articles/PMC4294025/
https://ncbi.nlm.nih.gov/pubmed/25537591
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S1600577514024412
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