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Fundamental role of arsenic flux in nanohole formation by Ga droplet etching on GaAs(001)

Nanoholes with a depth in the range of tens of nanometers can be formed on GaAs(001) surfaces at a temperature of 500°C by local etching after Ga droplet formation. In this work, we demonstrate that the local etching or nanodrilling process starts when the Ga droplets are exposed to arsenic. The ess...

Täydet tiedot

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Bibliografiset tiedot
Päätekijät: Fuster, David, González, Yolanda, González, Luisa
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: Springer 2014
Aiheet:
Linkit:https://ncbi.nlm.nih.gov/pmc/articles/PMC4071335/
https://ncbi.nlm.nih.gov/pubmed/24994962
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-309
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