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Thin films with high surface roughness: thickness and dielectric function analysis using spectroscopic ellipsometry
An optical surface roughness model is presented, which allows a reliable determination of the dielectric function of thin films with high surface roughnesses of more than 10 nm peak to valley distance by means of spectroscopic ellipsometry. Starting from histogram evaluation of atomic force microsco...
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| Hlavní autoři: | , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Springer International Publishing
2014
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3929596/ https://ncbi.nlm.nih.gov/pubmed/24570853 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/2193-1801-3-82 |
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