Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography

In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (10(15) cm(−3)) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon r...

Celý popis

Uloženo v:
Podrobná bibliografie
Hlavní autoři: Dehzangi, Arash, Larki, Farhad, Hutagalung, Sabar D., Goodarz Naseri, Mahmood, Majlis, Burhanuddin Y., Navasery, Manizheh, Hamid, Norihan Abdul, Noor, Mimiwaty Mohd
Médium: Artigo
Jazyk:Inglês
Vydáno: Public Library of Science 2013
Témata:
Research Article
On-line přístup:https://ncbi.nlm.nih.gov/pmc/articles/PMC3679133/
https://ncbi.nlm.nih.gov/pubmed/23776479
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1371/journal.pone.0065409
Tagy: Přidat tag
Žádné tagy, Buďte první, kdo otaguje tento záznam!

Podobné jednotky