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Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography
In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (10(15) cm(−3)) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon r...
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| Hlavní autoři: | , , , , , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Public Library of Science
2013
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3679133/ https://ncbi.nlm.nih.gov/pubmed/23776479 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1371/journal.pone.0065409 |
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