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Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method
The paper presents a method for the high-resolution production of polymer nanopatterns with controllable geometrical parameters by means of a single-spot electron-beam lithography technique. The essence of the method entails the overexposure of a positive-tone resist, spin-coated onto a substrate wh...
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| Gepubliceerd in: | Beilstein J Nanotechnol |
|---|---|
| Hoofdauteurs: | , , , |
| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
Beilstein-Institut
2015
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| Onderwerpen: | |
| Online toegang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4419585/ https://ncbi.nlm.nih.gov/pubmed/25977869 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.6.101 |
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