A carregar...
SML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography
A detailed process characterization of SML electron beam resist for high-aspect-ratio nanopatterning at high sensitivity is presented. SML contrast curves were generated for methyl isobutyl ketone (MIBK), MIBK/isopropyl alcohol (IPA) (1:3), IPA/water (7:3), n-amyl acetate, xylene, and xylene/methano...
Na minha lista:
| Main Authors: | , , |
|---|---|
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer
2013
|
| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3617037/ https://ncbi.nlm.nih.gov/pubmed/23531370 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-139 |
| Tags: |
Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!
|