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Ice-assisted electron beam lithography of graphene

We demonstrate that a low energy focused electron beam can locally pattern graphene coated with a thin ice layer. The irradiated ice plays a crucial role in the process by providing activated species that locally remove graphene from a silicon dioxide substrate. After patterning the graphene, the ic...

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Библиографические подробности
Главные авторы: Gardener, Jules A, Golovchenko, Jene A
Формат: Artigo
Язык:Inglês
Опубликовано: 2012
Предметы:
Online-ссылка:https://ncbi.nlm.nih.gov/pmc/articles/PMC3350975/
https://ncbi.nlm.nih.gov/pubmed/22498712
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/0957-4484/23/18/185302
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