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Ice Lithography for Nano-Devices
We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifyi...
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| Autors principals: | , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
2010
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3072455/ https://ncbi.nlm.nih.gov/pubmed/21038857 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/nl1032815 |
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