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Nanopatterning on non-planar and fragile substrates with ice resists
Electron beam (e-beam) lithography using polymer resists is an important technology that provides the spatial resolution needed for nanodevice fabrication. But it is often desirable to pattern non-planar structures on which polymeric resists cannot be reliably applied. Furthermore, fragile substrate...
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| Main Authors: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3275690/ https://ncbi.nlm.nih.gov/pubmed/22229744 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/nl204198w |
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