Caricamento...
Nanopatterning on non-planar and fragile substrates with ice resists
Electron beam (e-beam) lithography using polymer resists is an important technology that provides the spatial resolution needed for nanodevice fabrication. But it is often desirable to pattern non-planar structures on which polymeric resists cannot be reliably applied. Furthermore, fragile substrate...
Salvato in:
| Autori principali: | , , , |
|---|---|
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
2012
|
| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3275690/ https://ncbi.nlm.nih.gov/pubmed/22229744 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/nl204198w |
| Tags: |
Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne! !
|