A carregar...
Si nanowires by a single-step metal-assisted chemical etching process on lithographically defined areas: formation kinetics
In this paper, we investigate the formation kinetics of Si nanowires [SiNWs] on lithographically defined areas using a single-step metal-assisted chemical etching process in an aqueous HF/AgNO(3 )solution. We show that the etch rate of Si, and consequently, the SiNW length, is much higher on the lit...
Na minha lista:
| Main Authors: | , , |
|---|---|
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer
2011
|
| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3339842/ https://ncbi.nlm.nih.gov/pubmed/22087735 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-597 |
| Tags: |
Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!
|