Loading...
Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask
ABSTRACT: We report on Si nanopatterning through an on-chip self-assembled porous anodic alumina (PAA) masking layer using reactive ion etching based on fluorine chemistry. Three different gases/gas mixtures were investigated: pure SF(6), SF(6)/O(2), and SF(6)/CHF(3). For the first time, a systemati...
Na minha lista:
| Main Authors: | , , |
|---|---|
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Springer
2013
|
| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3605172/ https://ncbi.nlm.nih.gov/pubmed/23402551 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-71 |
| Tags: |
Tilføj Tag
Ingen Tags, Vær først til at tagge denne postø!
|