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Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask
ABSTRACT: We report on Si nanopatterning through an on-chip self-assembled porous anodic alumina (PAA) masking layer using reactive ion etching based on fluorine chemistry. Three different gases/gas mixtures were investigated: pure SF(6), SF(6)/O(2), and SF(6)/CHF(3). For the first time, a systemati...
में बचाया:
| मुख्य लेखकों: | , , |
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| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
Springer
2013
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| विषय: | |
| ऑनलाइन पहुंच: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3605172/ https://ncbi.nlm.nih.gov/pubmed/23402551 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-71 |
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