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Molecular sputter depth profiling using carbon cluster beams
Sputter depth profiling of organic films while maintaining the molecular integrity of the sample has long been deemed impossible because of the accumulation of ion bombardment-induced chemical damage. Only recently, it was found that this problem can be greatly reduced if cluster ion beams are used...
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| Autors principals: | , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
2009
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2863088/ https://ncbi.nlm.nih.gov/pubmed/19649771 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s00216-009-2971-x |
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