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Molecular Depth Profiling using a C(60) Cluster Beam: the Role of Impact Energy

Molecular depth profiling of organic overlayers was performed using a mass selected C(60) ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of sputter depth profiles acquired for a 300-nm Trehalose film on silicon were studied as a function of the kinetic...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Wucher, Andreas, Cheng, Juan, Winograd, Nicholas
Format: Artigo
Sprache:Inglês
Veröffentlicht: 2008
Schlagworte:
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC2662745/
https://ncbi.nlm.nih.gov/pubmed/19855815
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/jp8049763
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