Experimental study of inductively coupled plasma etching of patterned single crystal diamonds

Abstract In this study, the inductively coupled plasma (ICP) etching process for patterning single-crystal diamond was experimentally investigated using O₂/Ar as the etching gas. The influence of various etching parameters on the process was analyzed via laser confocal microscopy. Taking etching rat...

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Hlavní autoři:	Lei Zhao, Xiangbing Wang, Nan Jiang, Kazhihito Nishimura, Jian Yi, Shuangquan Fang
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	Nature Portfolio 2025-07-01
Edice:	Scientific Reports
Témata:	Inductively coupled plasma etching Etching parameters Single crystal diamond Etching rate Surface roughness
On-line přístup:	https://doi.org/10.1038/s41598-025-08066-3
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