Experimental study of inductively coupled plasma etching of patterned single crystal diamonds
Abstract In this study, the inductively coupled plasma (ICP) etching process for patterning single-crystal diamond was experimentally investigated using O₂/Ar as the etching gas. The influence of various etching parameters on the process was analyzed via laser confocal microscopy. Taking etching rat...
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| Auteurs principaux: | , , , , , |
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| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Nature Portfolio
2025-07-01
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| Collection: | Scientific Reports |
| Sujets: | |
| Accès en ligne: | https://doi.org/10.1038/s41598-025-08066-3 |
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