Experimental study of inductively coupled plasma etching of patterned single crystal diamonds

Abstract In this study, the inductively coupled plasma (ICP) etching process for patterning single-crystal diamond was experimentally investigated using O₂/Ar as the etching gas. The influence of various etching parameters on the process was analyzed via laser confocal microscopy. Taking etching rat...

Disgrifiad llawn

Manylion Llyfryddiaeth

Prif Awduron:	Lei Zhao, Xiangbing Wang, Nan Jiang, Kazhihito Nishimura, Jian Yi, Shuangquan Fang
Fformat:	Artigo
Iaith:	Inglês
Cyhoeddwyd:	Nature Portfolio 2025-07-01
Cyfres:	Scientific Reports
Pynciau:	Inductively coupled plasma etching Etching parameters Single crystal diamond Etching rate Surface roughness
Mynediad Ar-lein:	https://doi.org/10.1038/s41598-025-08066-3
Tagiau:	Ychwanegu Tag Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!