Experimental study of inductively coupled plasma etching of patterned single crystal diamonds
Abstract In this study, the inductively coupled plasma (ICP) etching process for patterning single-crystal diamond was experimentally investigated using O₂/Ar as the etching gas. The influence of various etching parameters on the process was analyzed via laser confocal microscopy. Taking etching rat...
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| Principais autores: | , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Portfolio
2025-07-01
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| Colecção: | Scientific Reports |
| Assuntos: | |
| Acesso em linha: | https://doi.org/10.1038/s41598-025-08066-3 |
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