An Improved YOLOv7-Tiny-Based Algorithm for Wafer Surface Defect Detection
Wafer surface defect detection is a critical component in the chip manufacturing process. To address the shortcomings of manual inspection and the limitations of existing machine learning methods, this paper proposes a wafer defect detection algorithm based on an improved YOLOv7-tiny. First, a coord...
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| Principais autores: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
IEEE
2025-01-01
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| coleção: | IEEE Access |
| Assuntos: | |
| Acesso em linha: | https://ieeexplore.ieee.org/document/10836686/ |
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